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Contact Resistance of Ti-Si-C-Ag and Ti-Si-C-Ag-Pd Nanocomposite Coatings
Jönköping University, School of Engineering, JTH. Research area Materials and manufacturing - Surface technology.
Thin Film Physics Division, Department of Physics, Chemistry, and Biology, IFM, Linköping University, Linköping, Sweden .
Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden .
Department of Materials Chemistry, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
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2012 (English)In: Journal of Electronic Materials, ISSN 0361-5235, E-ISSN 1543-186X, Vol. 41, no 3, p. 560-567Article in journal (Refereed) Published
Abstract [en]

Ti-Si-C-Ag-Pd and Ti-Si-C-Ag nanocomposite coatings were deposited by direct-current magnetron sputtering on Cu substrates with an electroplated Ni layer. Analytical electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy show that the nanocomposites consist of TiC, Ag:Pd, and amorphous SiC. The contact resistance of these coatings against a spherical Au-Co surface was measured for applied contact forces up to 5 N. Ti-Si-C-Ag-Pd coatings with Ag:Pd top coating had ~10 times lower contact resistance at contact forces below 1 N (~10 mΩ at ~0.1 N), and 2 to 3 times lower for contact forces around 5 N (<1 mΩ at 5 N), compared with the Ti-Si-C-Ag coating.

Place, publisher, year, edition, pages
Springer, 2012. Vol. 41, no 3, p. 560-567
Keywords [en]
Titanium carbide, nanocomposite, physical vapor deposition (PVD), contact resistance, surface roughness, silver palladium
National Category
Composite Science and Engineering Manufacturing, Surface and Joining Technology
Identifiers
URN: urn:nbn:se:hj:diva-17245DOI: 10.1007/s11664-011-1813-8ISI: 000299930100022Local ID: JTHMaterialISOAI: oai:DiVA.org:hj-17245DiVA, id: diva2:480299
Available from: 2012-01-19 Created: 2012-01-19 Last updated: 2018-06-01Bibliographically approved

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Leisner, Peter

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