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Electrochemical deposition of Co nanowire arrays: quantitative consideration of concentration profiles
Jönköping University, School of Engineering, JTH. Research area Materials and manufacturing - Surface technology. Jönköping University, School of Engineering, JTH. Research area Robust Embedded Systems.
2001 (English)In: Electrochimica Acta, ISSN 0013-4686, E-ISSN 1873-3859, Vol. 47, no 6, p. 865-874Article in journal (Refereed) Published
Abstract [en]

Electrodeposition of Co into ion track etched polycarbonate membranes by a chronoamperometric method has been studied. The concentration variation and diffusion limiting current during nanoprocessing for growth of Co in nanoelectrode applications are described for two regimes; in the vicinity of the electrode and at the mouth of pores. The behaviour of the as-deposited nanoelectrodes can be modelled as a recessed microelectrode. A diffusion controlled limiting current of the nanodes is studied by the Cottrell equation at short times, i.e. current αt−1/2. At longer times, a steady-state current is obtained due to gradually increasing radii, r, of the spherical diffusion zones from each recessed nanode, i.e. current α(1/(r+L)), where L is the membrane thickness. The experimental value of diffusion coefficient D for Co ions was found: D=2.5×10–5 cm2 s−1. XRD and TEM measurements on 250 nm diameter and 20 μm long Co nanowires showed a hexagonal closed packed phase with a 〈100〉 texturing. The nanowires exhibited an enhanced magnetic coercivity in comparison to bulk Co. The difference of saturation fields between the parallel and perpendicular orientation fields corresponds well to the expected demagnetisation field of 2πM=8796 Oe value due to the shape anisotropy in case of an infinite thin Co cylinder.

Place, publisher, year, edition, pages
2001. Vol. 47, no 6, p. 865-874
Keyword [en]
Nanodes, Spherical diffusion, Magnetic properties, Nanostructures
National Category
Manufacturing, Surface and Joining Technology
Identifiers
URN: urn:nbn:se:hj:diva-6187DOI: 10.1016/S0013-4686(01)00797-6OAI: oai:DiVA.org:hj-6187DiVA, id: diva2:37007
Note
Forskningsområdet Robusta inbyggda system bytte namn till Forskningsmiljö Material och tillverkning – Ytteknik 2011-01-01 Research area Robust Embedded Systems changed its name to Research area Materials and manufacturing - Surface technology 01-01-2011 Available from: 2007-08-03 Created: 2007-08-03 Last updated: 2017-12-12Bibliographically approved

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Leisner, Peter

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