Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Calculation approach for current-potential behaviour during pulse electrodeposition based on double-layer characteristics
Chemnitz University of Technology, Institute of Materials Science and Engineering, Technische Universität Chemnitz, Chemnitz, Germany.ORCID iD: 0000-0002-7120-1489
2014 (English)In: Transactions of the Institute of Metal Finishing, ISSN 0020-2967, E-ISSN 1745-9192, Vol. 92, no 6, p. 325-335Article in journal (Refereed) Published
Abstract [en]

This paper introduces a phenomenological calculation approach for the electrolytic pulse deposition of nickel under high polarisation based on an equivalent electrical circuit. In a quasistationary state of the deposition, the electrolyte resistance and double layer parameters are identified by electrochemical impedance spectroscopy and galvanostatic polarisation. The charge-transfer resistance of both the anodic and cathodic electrode double layer is inversely proportional to the current density. This means the overpotentials over the electrode double layers are independent of the current density. For short pulse on-times and off-times (up to 10 ms), the behaviour of the electrolytic cell is mainly determined by the double layer characteristics and the calculation approach therefore allows the prediction of the current-potential behaviour during pulse deposition under high polarisation. For larger pulse widths, the time-dependent evolution of the overpotentials occurring at the electrode/electrolyte interface becomes a determining factor for the cell potential. 

Place, publisher, year, edition, pages
Maney Publishing, 2014. Vol. 92, no 6, p. 325-335
Keywords [en]
Electrochemical impedance spectroscopy, Nickel electrodeposition, Pulse plating, Transient simulation, Charge transfer, Deposition, Electric arcs, Electrodeposition, Electrodes, Nickel, Polarization, Spectroscopy, Charge transfer resistance, Electrode/electrolyte interfaces, Equivalent electrical circuits, Galvanostatic polarisation, Phenomenological calculation
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:hj:diva-51179DOI: 10.1179/0020296714Z.000000000205ISI: 000346154000007Scopus ID: 2-s2.0-84913600072OAI: oai:DiVA.org:hj-51179DiVA, id: diva2:1507510
Available from: 2020-12-08 Created: 2020-12-08 Last updated: 2020-12-08Bibliographically approved

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full textScopus

Authority records

Sieber, Maximilian

Search in DiVA

By author/editor
Sieber, Maximilian
In the same journal
Transactions of the Institute of Metal Finishing
Materials Engineering

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 107 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf