An open challenge for exact job scheduling with reticle batching in photolithographyShow others and affiliations
2022 (English)Conference paper, Published paper (Refereed)
Abstract [en]
We consider scheduling solutions for photolithography, an important sub-task in semi-conductor production, where patterns are transferred to wafers using reticles. The problem can be modelled as job scheduling on unrelated parallel machines with sequence-dependent setup times and release dates. The reticles add auxiliary-resource constraints for processing jobs. Equipping machines with the right reticles using transport robots from stockers in time renders this problem extremely difficult for exact solvers that use a declarative model. The latter would be attractive as such models tend to be compact and easy to maintain. We present a solver-independent MiniZinc model and provide 500 new benchmark instances. However, only small instances can be solved with state-of-the-art MIP and CP solvers. Consequently, we present this problem as an open challenge with considerable potential for driving improvements towards industrial applications.
Place, publisher, year, edition, pages
Association for the Advancement of Artificial Intelligence , 2022.
National Category
Computer Sciences
Identifiers
URN: urn:nbn:se:hj:diva-63653OAI: oai:DiVA.org:hj-63653DiVA, id: diva2:1839612
Conference
2022 Workshop on Knowledge Engineering for Planning and Scheduling, An ICAPS'22 Workshop, 15 June 2022, Singapore
2024-02-212024-02-212024-02-21Bibliographically approved