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Electrodeposited Sn-Cu-Ni alloys as lead-free solders on copper substrate using deep eutectic solvents: The influence of electrodeposition mode on the morphology, composition and corrosion behaviour
Center of Surface Science and Nanotechnology, University Politehnica of Bucharest, Splaiul Independentei 313, Bucharest, 060042, Romania.
Center of Surface Science and Nanotechnology, University Politehnica of Bucharest, Splaiul Independentei 313, Bucharest, 060042, Romania.
Department of Materials Science and Engineering, Delft University of Technology, Mekelweg 2, Delft, 2628 CD, Netherlands.
Department of Materials Science and Engineering, Delft University of Technology, Mekelweg 2, Delft, 2628 CD, Netherlands.
Vise andre og tillknytning
2024 (engelsk)Inngår i: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 477, artikkel-id 130324Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

In this work we present the pulsed current (PC) electrodeposition of Sn-Cu-Ni alloy as lead-free solder candidate, from choline chloride – ethylene glycol eutectic mixtures (1:2 molar ratio) onto copper metallic substrates. Electrolytes containing Sn2+, Cu2+ and Ni2+ salts in the selected deep eutectic solvent have been considered. The effect of the applied frequency of PC on the morphology, composition and melting point of the alloy is discussed and compared to the ones obtained using direct current (DC) plating mode. A refinement of the grain size and lower melting temperature of the alloy were noticed when pulsed current was applied. A comparative analysis of the electrochemical corrosion behaviour at macro- and micro- scale has been performed in 0.5 M and 0.1 M NaCl solutions involving potentiodynamic polarization curves, electrochemical impedance spectroscopy (EIS) and scanning vibrating electrode (SVET) techniques. Furthermore, an analysis after 96 h of exposure to salt mist test simulating a corrosive attack in harsh environment is presented, too. The obtained results showed enhanced corrosion resistance of the ternary alloys electrodeposited under PC conditions (the best for 1.67 Hz frequency) as compared to those using DC. Additionally, Raman spectroscopy evidenced the presence of tin oxi/hydroxy chloride and tin oxides as surface corrosion products. A corrosion mechanism has been proposed.

sted, utgiver, år, opplag, sider
Elsevier, 2024. Vol. 477, artikkel-id 130324
Emneord [en]
Corrosion behaviour, Deep eutectic solvents, Electrodeposition, Sn-Cu-Ni ternary alloy, SVET, Copper alloys, Copper corrosion, Corrosion resistance, Corrosion resistant alloys, Corrosive effects, Electrochemical corrosion, Electrochemical impedance spectroscopy, Electrodes, Ethylene, Ethylene glycol, Eutectics, Lead-free solders, Melting point, Molar ratio, Morphology, Nickel alloys, Organic solvents, Sodium chloride, Substrates, Tin alloys, Tin oxides, Choline chloride, Copper substrates, Electrodeposition mode, Morphology behavior, Pulsed currents, Pulsed-current electrodeposition, Scanning vibrating electrodes, Ternary alloys
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Identifikatorer
URN: urn:nbn:se:hj:diva-63273DOI: 10.1016/j.surfcoat.2023.130324ISI: 001148267500001Scopus ID: 2-s2.0-85180943601Lokal ID: ;intsam;926129OAI: oai:DiVA.org:hj-63273DiVA, id: diva2:1825763
Forskningsfinansiär
EU, Horizon 2020Tilgjengelig fra: 2024-01-10 Laget: 2024-01-10 Sist oppdatert: 2024-02-12bibliografisk kontrollert

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