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An Analysis of Applicability using Quality Metrics for Ontologies on Ontology Design Patterns
University of Rostock.
Högskolan i Jönköping, Tekniska Högskolan, JTH, Data- och elektroteknik. Högskolan i Jönköping, Tekniska Högskolan, JTH. Forskningsmiljö Informationsteknik.
2015 (engelsk)Inngår i: International Journal of Intelligent Systems in Accounting, Finance & Management, ISSN 1055-615X, E-ISSN 1099-1174, Vol. 22, nr 1, s. 81-99Artikkel i tidsskrift (Fagfellevurdert) Published
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Abstract [en]

Ontology design patterns (ODPs) provide best-practice solutions for common or recurring ontology design problems. This work focuses on content ODPs, which form small ontologies themselves and thus can be subject to ontology quality metrics in general. We investigate the use of such metrics for content ODP evaluation in terms of metrics applicability and validity. The quality metrics used for this investigation are taken from existing work in the area of ontology quality evaluation. We discuss the general applicability to content ODP of each metric considering its definition, ODP characteristics, and the defined goals of ODPs. The research process presented in this paper has two phases. In the first phase, we conducted a literature research in the area of metrics for assessing ontology quality. The second phase consisted of a two-step evaluation of the ontology metrics identified in the literature analysis. During the first step, we investigated whether the metrics are appropriate to differentiate between content ODPs of different quality. Metrics that proved to be applicable were calculated for a random set of 14 content ODPs. In the second step, a controlled experiment, the quality indicated by the metric value was contrasted with the perception of ontology engineers; that is, do ‘measured quality’ and ‘perceived quality’ match?

sted, utgiver, år, opplag, sider
Chichester: John Wiley & Sons, 2015. Vol. 22, nr 1, s. 81-99
Emneord [en]
Ontology Design Patterns, Quality Metrics, Semantic Web, Ontology Engineering
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URN: urn:nbn:se:hj:diva-28597DOI: 10.1002/isaf.1360ISI: 000409841500005Scopus ID: 2-s2.0-84942305392Lokal ID: JTHInformationsteknikISOAI: oai:DiVA.org:hj-28597DiVA, id: diva2:881812
Tilgjengelig fra: 2015-12-11 Laget: 2015-12-11 Sist oppdatert: 2018-05-07bibliografisk kontrollert

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