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Electrochemical Behavior of Conventional and Rheo-High-Pressure Die Cast Low Silicon Aluminum Alloys in NaCl Solutions
Univ Trento, Dept Ind Engn, Trento, Italy.
Univ Trento, Dept Ind Engn, Trento, Italy.
Högskolan i Jönköping, Tekniska Högskolan, JTH, Material och tillverkning.ORCID-id: 0000-0003-2924-137X
2019 (engelsk)Inngår i: Corrosion, ISSN 0010-9312, E-ISSN 1938-159X, Vol. 75, nr 11, s. 1339-1353Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The electrochemical behavior of a low silicon aluminum alloy cast by the conventional and rheo-high-pressure die cast processes is evaluated using polarization test and electrochemical impedance spectroscopy in 0.01 M, 0.05 M, 0.1 M, and 0.6 M sodium chloride solutions. Compared to the conventional high-pressure die cast process, rheocasting introduces some alterations in the microstructure including the presence of aluminum grains with different sizes, formed at different solidification stages. According to the results of the anodic polarization test, conventional cast and rheocast samples show similar breakdown potentials. However, the rheocast samples present enhanced oxygen reduction kinetics compared to the conventional cast sample. Based on scanning electron microscopy examinations, localized microgalvanic corrosion is the main corrosion mechanism for both alloys and it initiates at the interface of aluminum with iron-rich intermetallic particles which are located inside the eutectic regions. The corrosion further develops into the eutectic area. Although the rate of the cathodic reaction can be influenced by the semisolid microstructure, according to the results of anodic polarization and electrochemical impedance spectroscopy tests, the corrosion behavior is not meaningfully affected by the casting process.

sted, utgiver, år, opplag, sider
NACE International, 2019. Vol. 75, nr 11, s. 1339-1353
Emneord [en]
aluminum-silicon alloy, intermetallic particles, micro-galvanic corrosion, rheocasting, semisolid casting
HSV kategori
Identifikatorer
URN: urn:nbn:se:hj:diva-46913DOI: 10.5006/3254ISI: 000493898700009Scopus ID: 2-s2.0-85079013140Lokal ID: PP JTH 2019 embargo 03;JTHMaterialISOAI: oai:DiVA.org:hj-46913DiVA, id: diva2:1373437
Tilgjengelig fra: 2019-11-27 Laget: 2019-11-27 Sist oppdatert: 2020-02-24bibliografisk kontrollert

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